ATTN: cross set to alt.lasers, sci.physics, sci.physics.particle, FuT
NOT set, by request.

Greetings to all,

First of all, i hope that my choice of groups might shed some light on
the following question, especially sci.physics.particle in certain
issues.

So, as far as i am aquatinted with the problem of ultra violet
lithography, currently the most ultra violet lasers are ArF on 192nm.
"Taking" it to one quarter of wave length, we can expect recently
announced 45nm lithography, but my first question is: what's next? Can
we go beyond one quarter of wave length? Are there "more violet" lasers
to be produced?

Now, that was regarding the technical part, but as far as i know, in
order to produce such low wavelength lithography, one must obtain
favorable level of simultaneous and spontaneous emission, given by the
following equation:

A/B = 8 pi h c (1/wave length)^3

now that would make approximately this chart:

650 nm 1.82*10^-5
350 nm 1.17*10^-4
192 nm 7.06*10^-4
65 nm 0.018
17 nm 1.01

So, what really happens after semiconductor industry would try to go
beyond ~17nm? Is it even possible, or is it just a theoretical model?
Also (particle group, i belive you should know a bit more on this one),
how do quantum effects exihibits on such low wave lengths, such as
transforming conductors to isolators, tunneling effects, electron leaps
and similar effects? Is there way to bypass those?

I hope that i haven't made to much beginners errors and that you were
able to understand my questions. Also, if these matters have been
discussed elsewhere, can someone provide a link or reference?

Thanks in advance!